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XPS
determine the atomic composition of a surface.
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Electron Spectrometers
SPECS Surface Nano Analysis GmbH
Nanotechnology is focused on the engineering and the physical properties of small structures. Therefore techniques that have sensitivities at a scale of 0.1 nm to 100 nm are required to study these structures. Different methods of electron spectroscopy (XPS, UPS and AES) have a sensitivity in this range and are therefore key techniques in nanoscience.Thanks to our high level of expertise in electron optics and electronics we can offer electron spectrometers with the highest resolution and transmission possible.
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Imaging X-Ray Photoelectron Spectrometer
AXIS Supra+
X-ray photoelectron spectroscopy (XPS) is unique in providing quantitative elemental and chemical state information from the uppermost 10 nm of a materials surface. The AXIS Supra+ (also known as Kratos Ultra 2+ in Japan) is a market leading X-ray photoelectron spectrometer combining state-of-the-art spectroscopic and imaging capabilities with the highest level of automation currently available. Unrivalled large area spectroscopic performance allows photoelectron spectra to be acquired from all types of materials including metals, semi-conductors and insulators. Fast, high spatial resolution XPS imaging reveals the lateral distribution of surface chemistry and aids further characterisation with selected small area analysis.
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Imaging X-Ray Photoelectron Spectrometer
Kratos AXIS Nova
X-ray photoelectron spectroscopy (XPS), also known as electron spectroscopy for chemical analysis (ESCA), is a mature and widely used surface analysis technique for materials characterisation. XPS provides quantitative elemental and chemical state information from the upper most 10 nm of material. The The AXIS Nova photoelectron spectrometer can collect X-ray photoelectron spectra and images from any material that is stable under the ultra-high vacuum conditions required for the technique.
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Large Format Infrared Inspection Windows
FLIR IRW-xPC/xPS Series
The FLIR IRW-xPC/xPS joins the existing FLIR IR Window family to help you inspect more efficiently, make inaccessible components accessible, and save money by preventing unplanned downtime. The rectangular polymer windows are impact resistant and provide the largest viewing area available to monitor completely undisturbed assets inside energized electrical equipment. IR Windows-xPC/xPS are durable and stable in harsh environments, making them suitable for most industrial settings as well as for shipboard use.
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Materials Metrology
VeraFlex Family
Nova Measuring Instruments Inc.
World-class XPS and XRF metrology technologies for semiconductor process control.
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Surface Analysis
Shimadzu offers a range of instruments that are ideal for all sample forms handled by customers in the fields of steel, non-ferrous metals, environment, foods, chemicals, pharmaceuticals, semiconductors, ceramics, and polymers. EPMA/SEM offers analysis of targets from several centimeters to several microns; XPS offers analysis from several millimeters to several microns; and SPM permits observations from over a hundred microns to several nanometers.
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XPS/ESCA Service
X-ray Photoelectron Spectroscopy (XPS Analysis), also known as Electron Spectroscopy for Chemical Analysis (ESCA), is used to determine quantitative atomic composition and chemistry. It is a surface analysis technique with a sampling volume that extends from the surface to a depth of approximately 50-70 Angstroms. Alternatively, XPS analysis can be utilized for X-ray Photoelectron Spectroscopy (XPS) or Electron Spectroscopy for Chemical Analysis (ESCA) from Evans Analytical Group (EAG).sputter depth profiling to characterize thin films by quantifying matrix-level elements as a function of depth.
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X-Ray Photoelectron Spectrometer
AXIS Supra
AXIS SupraTM is an X-ray photoelectron spectrometer (XPS) with unrivalled automation and ease of use for materials surface characterisation. The patented AXIS technology ensures high electron collection efficiency in spectroscopy mode and low aberrations at high magnifications in parallel imaging mode. XPS spectroscopy and imaging results can be complemented by additional surface analysis techniques such as: ultraviolet photoemission spectroscopy (UPS); Schottky field emission scanning Auger microscopy (SAM) and secondary electron microscopy (SEM) and ion scattering spectroscopy (ISS). The AXIS Supra replaces the AXIS Ultra DLD as Kratos' flagship x-ray photoelectron spectrometer.
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Sematech Analysis and SEMI Standards Analysis
Rocky Mountain Laboratories, Inc.
Rocky Mountain Laboratories, Inc. provides SEMI Standards analyses that conform to the following SEMATECH and SEMI Standards for testing of passivated 316L stainless steel components being considered for installation into a high-purity gas distribution system:SEMASPEC #90120401B-STD (SEM Analysis)SEMASPEC #90120402B-STD (EDS Analysis)SEMASPEC #90120403B-STD (XPS Analysis)SEMASPEC #91060573B-STD (Auger (AES) Analysis)SEMI F60-0306 (based on F60-0301) (XPS Analysis)SEMI F72-1102 (Auger (AES) Analysis)
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X-ray Photoelectron Spectroscopy Analysis (XPS Analysis)
Rocky Mountain Laboratories, Inc.
X-ray photoelectron spectroscopy (XPS Analysis) also called Electron Spectroscopy for Chemical Analysis (ESCA) is a chemical surface analysis method. XPS measures the chemical composition of the outermost 100 Å of a sample. Measurements can be made at greater depths by ion sputter etching to remove surface layers.
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Analytical Services
Surface Analysis; X-Ray Photoelectron Spectroscopy (XPS, ESCA), Auger Electron Spectroscopy (AES), Time-of-Flight Secondary Ion Mass Spectrometry (Static) (TOF-SIMS), Dynamic Secondary Ion Mass Spectrometry (D-SIMS). Microscopy & Diffraction; Organic Material Analysis; Bulk Chemistry.
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Cr(VI) ROHS Testing
Rocky Mountain Laboratories, Inc.
Rocky Mountain Laboratories is now offering testing to detect Cr(VI) on the surface of materials. ROHS standards for export of materials to Europe require testing for Cr(VI), and with our XPS instrument, we can provide that testing.
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Scanning XPS Microprobe
PHI Quantera II
The core technology of the PHI Quantera II is PHI’s patented, monochromatic, micro-focused, scanning x-ray source which provides excellent large area and superior micro-area spectroscopy performance. Spectroscopy, depth profiling, and imaging can all be performed over the full range of x-ray beam sizes including the minimum x-ray beam size of less than 7.5 µm. In addition to superior XPS performance characteristics the PHI Quantera II provides two in situ sample parking stations which enables the automated analysis of all three sample platens in a single user defined analysis queue.
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Scanning XPS Microprobe
PHI VersaProbe III
The PHI VersaProbe III is a highly versatile, multi-technique instrument with PHI’s patented, monochromatic, micro-focused, scanning X-ray source. The instrument offers a true SEM-like ease of operation with superior micro area spectroscopy and excellent large area capabilities. The fully integrated multi-technique platform of the PHI VersaProbe III offers an array of optional excitation sources, sputter ion sources, and sample treatment and transfer capabilities. These features are essential in studying today’s advanced materials and in supporting your material characterization and problem-solving needs.
