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Reticle Handling
A reticle/mask exchange and inspection system. Individual I/O stations allow transfer of the reticle/mask between all scanner/stepper and shipping boxes, such as Canon, Nikon, ASML, Toppan, Hoya, DMS box etc.).
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In Situ Process Management
KLA’s comprehensive portfolio of SensArray® products enables in situ monitoring of process tools’ environments. With wired and wireless sensor wafers and reticles, an automation package and data analysis systems, SensArray products provide comprehensive information for a wide range of wafer and reticle processes. Wafer process equipment manufacturers, IC manufacturers and reticle manufacturers use SensArray data to visualize, diagnose and control process conditions.
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Reticle Manufacturing
An error-free reticle (also known as a photomask or mask) represents a critical element in achieving high semiconductor device yields, since reticle defects or pattern placement errors can be replicated in many die on production wafers. Reticles are built upon blanks: substrates of quartz deposited with absorber films. KLA’s portfolio of reticle inspection, metrology and data analytics systems help blank, reticle and IC manufacturers identify reticle defects and pattern placement errors, thereby reducing yield risk.
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Optical Apertures
The APPLIED IMAGE Optical Aperture reticles are available in sizes from 10μm (0.01mm) to 1,000μm (1.0mm) center openings (noted by -10, -25, -30 etc.), on either Chrome on Glass or Chrome on Opal material, with an overall size of 25.4mm (1.0 inch) diameter.
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Optical Slits
The APPLIED IMAGE Optical Slit reticles are available in sizes from 10μm (0.01mm) to 1,000μm (1.0mm) widths, on either Chrome on Glass or Chrome on Opal material, with an overall size of 25.4mm (1.0 inch) diameter.
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Custom Optical Components and Standards
With the amount of applications that optical components have, no one could hope to have the perfect component for every possible scenario. For this reason, APPLIED IMAGE makes easy the process of designing, building, and delivering custom components to our customers. Our engineering process is designed to produce the best parts in the industry and more importantly, the best component for your specific needs. The APPLIED IMAGE experience will cover the project with expert engineers from start to finish. Use the form below to start the conversation for checkerboard and dot arrays, stage and image analysis micrometers, reticles and machine vision components.
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Reticles / Graticules
With over 30 years experience in the manufacturing of high precision Custom and Standard Reticles for a wide range of applications, APPLIED IMAGE has gained a reputation for delivering precision and accuracy parts on time. Using our state of the art technology, our components are the most precise in the industry. Applications of this technology is useful in Day/Night Sights, Binoculars, Targeting Systems, Telescopes, Tank Sights, Microscopes, and many other Bore-Sight devices.
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Reticles, Optical Slits, Optical Apertures
With over 30 years of experience in the manufacturing of high precision Reticles, Slits, Apertures, and Pinholes, APPLIED IMAGE has gained a reputation for delivering precise and accurate parts. We have supplied thousands of these parts to be used in Day/Night Sights, Binoculars, Targeting Systems, Telescopes, Tank Sights, Microscopes, and many other Bore-Sight devices.
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Equipment Front End Module (EFEM) Class 1 Minienvironment System
MiniMax™
Genmark’s MiniMax™ Equipment Front End Module (EFEM) is a class 1 minienvironment system designed to maximize productivity of semiconductor processing equipment tools that require the highest level of automation.The MiniMax™ can be customized to meet the automation requirements of any semiconductor manufacturing tool application and specified with one of the Genmark’s sophisticated and precise wafer and reticle handling robots, including the full line of patented GPR single or dual arm robots, GREX robot series, single and dual wafer aligners, FOUP/FOSB openers, reticle libraries, as well as any other customer specified equipment.
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Reticle / Mask Particle Detection System
PR-PD2HR
In semiconductor plants, where high performance and demanding functionality are required, the HORIBA PD Series'' high operating rate and long-term dependability have earned it a solid reputation. Inheriting a transfer system that has proven to provide stable, high performance and superior throughput over long operating periods, the PR-PD2HR now offers the most sensitive detection in the series with exclusive signal processing that can detect particles as small as 0.35 m.
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Particle Size Standards
Whether testing for particle size, count, or composition, it is imperative to use reliable particle suspensions to calibrate your surface scanning equipment or particle counters. A particle standard consists of a specific size range and number concentration of solid particles suspended in ultra-pure water (UPW). This suspension is dispersed into clean air or nitrogen and deposited onto wafers and reticles in specific patterns and sizes.
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IEEE Test Charts (Video /Cine)
IEEE Test Charts (Video /Cine) by Applied Image - IEEE Video Resolution Chart, Picture Height Test Chart, Microsoft WebCam Image Quality Test, OTTO-2 Otto Nemenz Cine Lens Calibration Reticle
