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MASK MVM-SEM® E3600 Series
E3630
Together with the miniaturization of semiconductors, high-accurate and stable measurement and evaluation is needed for circuit patterns such as mask patterns and holes. Advantest's E3600 series are used by a wide variety of companies, from semiconductor manufacturers to photomask makers to device and materials producers.
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MASK MVM-SEM® E3600 Series
E3640
Ongoing semiconductor process shrinks are driving new demand for stable, highly precise measurement of pattern dimensions for photomask and wafer production. The E3640 satisfies these requirements with industry-leading precision measurement capabilities and upgraded functionality that enhances mask R&D and production efficiency.
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MASK MVM-SEM® E3600 Series
E3650
Amid the progress of multiple-exposure technology, and the development of finer-pitch and more complicated circuits, as well as increases in the number of masks and the number of measurement points on each mask, the size of wiring patterns formed on photomasks needs to be measured and evaluated stably with high precision. Advantest’s E3600 series meets the needs of state-of-the-art devices with high measurement repeatability and stable throughput.
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PhotoMASK Services
For years APPLIED IMAGE has been serving customers who work with semiconductors, displays, PCB, MEMS, along with college professors, researchers, and students with Photomask making solutions tailored specifically to each customer’s needs. Working with a dedicated sales engineer means that you will have all of your questions answered.
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PHOTOMASK INSPECTION MACHINE
NEGATIVE FILM
Negative film and photomask inspection originated from the extensive use of printed circuit boards. Negative films and photomasks are used in large quantities. The early detection method is to use the "inspection light table" for inspection, which requires too much manpower and material resources, and manual testing may be due to eye fatigue and negligence.
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Breakthrough compressors for the GDSII and MEBES formats
GDZip + MEZip
Recognizing the challenge to transfer, manipulate, and store the exponentially-increasing size of IC design files, Solution-Soft has developed gdzip and mezip, breakthrough compressors for the GDSII and MEBES formats used by the industry. The MEBES format is the most commonly used format for electron beam lithography and photomask production. The GDSII stream is the standard exchange format between the design world and the mask shops.
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Photomask Stations
Fast, sensitive, economic, off-line photomask defect review. Our 300 series photomask inspection and review stations use long working-distance microscopy and a unique four-way lighting system to greatly speed up location and identification of micron- and submicron-sized defects
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Mask Flatness Measurement System
Tropel® UltraFlatTM 200 Mask System
The Tropel® UltraFlatTM 200 Mask System was designed specifically for the photomask industry. It delivers the lowest measurement uncertainty for ever-tightening mask flatness specifications. Shrinking device features require not only flatter wafers, but flatter masks.
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Critical Dimension Measurement System
MicroLine® Series
The MicroLine series of non-contact critical dimensional measurement systems are ideal for semiconductor and MEMS applications. MicroLine systems automatically measure linewidth, overlay, and other critical features on wafers and photomasks. Systems are capable of measuring features from 0.5 m to 400 m in size. Measurement repeatability is 10 nm at 1 s (with 100x objective).
