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Micro-spot DUV Spectroscopic Reflectometry
FilmTek 2000 PAR
Scientific Computing International
A low-cost solution for high-throughput, fully-automated mapping of patterned wafers for development and production environments. Utilizes patented parabolic mirror technology to measure wavelengths from DUV to NIR with a spot size as small as 13µm. Fully user-customizable wafer mapping capabilities rapidly generate 2D and 3D data maps of any measured parameter.
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UV-VIS-NIR Spectrophotometer
SolidSpec-3700i/3700iDUV
The SolidSpec-3700i/3700i DUV have three detectors which cover the range from ultraviolet to near-infrared.
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DUV Mask Aligner
Model 200E
OAI’S Model 200E DUV Mask Aligner performs all the functions of the tabletop Model 200 Mask Aligner but utilizes a 185nm Excimer Lamp as the UV light source. It is used for Biotechnology Processing.
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Benchtop Metrology Solution
FilmTek 2000 PAR-SE
Scientific Computing International
Our most advanced benchtop metrology solution, engineered to meet the needs of nearly any advanced thin film measurement application, from R&D to production. Combines spectroscopic ellipsometry and DUV multi-angle polarized reflectometry with a wide spectral range to deliver the highest accuracy, precision, and versatility in the industry. Patented parabolic mirror technology allows for a small spot size down to 50µm, ideal for direct measurement of product wafers and patterned films.
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Birefringence Measurement Technology
Hinds Instruments Birefringence Measurement technology has been adopted by industry leaders world wide to measure birefringence and characterize stress birefringence in materials with unsurpassed accuracy, resolution and repeatability. Capable of measuring optical retardation at 0.001nm resolution with noise floors as low as 0.005nm, these systems are robust, dynamic and scalable to fit the demanding requirements of your application. We provide measurement systems across the light spectrum (DUV, VIS and NIR) and are able to measure virtually all optical materials.
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Deep Ultraviolet Observation System for Microscope
U-UVF248
Model Capable of High-magnification/High-contrast Deep Ultraviolet (DUV) Observation. A Semiconductor / FPD Inspection Microscopes.
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Micro-spot DUV Reflection and Transmission Spectrophotometry
FilmTek 3000 PAR
Scientific Computing International
Metrology system with a 50µm spot that delivers high-performance transmission and reflection measurement of patterned films deposited on transparent substrates. Ideally suited for measuring the thickness and optical constants of very thin absorbing films.
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Reflection/Transmission Spectrophotometry
FilmTek 3000 PAR-SE
Scientific Computing International
Engineered to meet the needs of any advanced thin film measurement application, excelling at material characterization on both transparent and non-transparent substrates. Combines spectroscopic ellipsometry, DUV multi-angle polarized reflectometry, and transmission measurement with a wide spectral range to meet the most challenging of measurement demands in both R&D and production. Patented parabolic mirror technology allows for a small spot size down to 50µm, ideal for direct measurement of product wafers and patterned films.
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Portable CCD Spectroradiometer
LMS-6000
The Portable CCD Colorimeter Spectroradiometer has the following versions which can measure different parameters: • LMS-6000: illuminance (lux), E(Fc), Ee(W/m2), Tc (K), Duv Correlated Color Temperature (CCT), Chromaticity Coordinates, CRI, Purity, Peak Wavelength, Dominant Wavelength, Half Bandwidth, Center Wavelength, Centroid Wavelength, Total Color Difference, Brightness Difference, Red-Green Degree, Yellow-Blue Degree, CCT Difference, SDCM Diagram, Spectrum Diagram • LMS-6000L: cd/m2, fL, Tc (K), Duv Correlated Color Temperature (CCT), Chromaticity Coordinates, CRI, Purity, Peak Wavelength, Dominant Wavelength, Half Bandwidth, Center Wavelength, Centroid Wavelength, Total Color Difference, Brightness Difference, Red-Green Degree, Yellow-Blue Degree, CCT Difference, SDCM Diagram, Spectrum Diagram • LMS-6000P: LMS-6000 Parameters+PAR, PPFD, YPFD, Blue-purple irradiance Eb, Yellow-green irradiance Ey, Red-orange irradiance Er, Ratio of red and blue radiation Erb_Ratio • LMS-6000S: LMS-6000 Parameters+PAR, PPFD, YPFD, Blue-purple irradiance Eb, Yellow-green irradiance Ey, Red-orange irradiance Er, Ratio of red and blue radiation Erb_Ratio, Rf and Rg according to TM-30 • LMS-6000F: LMS-6000 Parameters+Flicker test • LMS-6000B: LMS-6000 Parameters+Blue Light Hazard Weighted Irradiance according to GB/T20145, CIE S009/E:2002 • LMS-6000BF: LMS-6000 Parameters+Flicker test, Blue Light Hazard Weighted Irradiance according to GB/T20145, CIE S009/E:2002
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DUV Lithography Systems
ASML's deep ultraviolet (DUV) lithography systems dive deep into the UV spectrum to print the tiny features that form the basis of the microchip.
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Custom Metrology Solutions
4D custom interferometers and laser interferometers overcome difficult environments, complex setups and one-of-a-kind measurement problems, at wavelengths from DUV through IR.
