MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive,
Suite 201
Andover, MA 01810
United States
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KEINOS™ 2 MHz 5 KW, 11 KW & 13 KW RF Plasma Generators
The KEINOS™ 2MHz plasma generator builds on the solid, reliable attributes of the existing 2MHz design. KEINOS™ incorporates the latest technology from MKS to enable demanding applications of pulsing, fast impedance changes and shorter process steps. KEINOS™ can deliver up to 13kW of power, pulsing up to 50KHz, multiple set point pulsing, pulse shaping and MKS patented frequency tuning. KEINOS™ uses an integrated VI sensor for power accuracy and digital based control for fast response times.
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Reference Pressure Transducers
These Baratron® capacitance manometers offer our highest level of presure measurement accuracy making them ideal for calibration transfer standards.
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FTIR Gas Analyzers
FTIR Spectroscopy gas analyzer instruments from MKS Instruments are capable of ppb to ppm sensitivity for multiple gas species in a variety of gas analysis applications, such as toxic gas detection, automotive emissions measurement, and monitoring stack emissions, processes, ambient air, purity, and selective catalytic reduction performance.
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General Performance Absolute Pressure Transducers
These general performance Baratron® capacitance manometers are referenced to vacuum for absolute pressure measurement applications.
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DELTA™ IV 4-zone Flow Ratio Controller
DELTA™ IV 4-zone Flow Ratio Controller is a digital controlled, browser-enabled, process control instrument providing the latest gas flow ratio measurement and control technology to meet the demands of multi-channel flow distribution for semiconductor, flat panel, and solar panel process uniformity and control. It is available in EtherCAT® or DeviceNet™ providing the latest gas flow ratio measurement and control technology to meet the demands of multi-channel flow distribution.
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Ozone Gas Generators
SEMOZON® Ozone gas generators and subsystems are the industry standard for compact, high concentration, ultra-clean ozone gas generation. Applications include Atomic Layer Deposition (ALD), Atomic Layer Etch (ALE), Chemical Vapor Deposition (CVD) and Wet Cleaning.
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Ozone Gas Delivery Systems
MKS ozone gas delivery systems provide field-proven, high concentration, ultra-clean ozone generation for advanced thin film applications such as Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Tetraethyl Orthosilicate (TEOS)/Ozone CVD (HDSACVD), contaminant removal and oxide growth. Gas delivery models have integrated ozone concentration monitoring, flow control, and power distribution. Additional system options include safety monitoring, status indicators and ozone destruction capability.
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Vapor Source Mass Flow Controller With Viscous Choked Flow
The 1150C Vapor Source Mass Flow Controllers are pressure based measurement and control systems designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas using viscous flow through a choked orifice.
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R*evolution® Remote Plasma Source
The innovative R*evolution® Remote Plasma Source combines field-proven, low-field toroidal plasma technology with an actively cooled plasma chamber made of high purity quartz, significantly reducing oxygen, hydrogen and nitrogen atomic gas loss through wall recombination. Self-contained and compact, R*evolution delivers up to 10 slm of oxygen radicals from a 6kW power supply with true power accuracy of <1% resulting in a high density, extremely clean radical source for photoresist strip and an optimal clean rate greater than 12 microns/min-1. R*evolution can be used for other surface preparation applications.
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Process And Chamber Monitoring Software & Systems
MKS process and monitoring solutions feature real-time, web-enabled, hardware, software, and systems to support a variety of tools and processes. These solutions improve performance and yield while reducing tool damage and false alarms.
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General Performance Absolute Pressure Switches
These absolute vacuum / pressure switches offer fast, accurate, and reliable protection for vacuum equipment and processes. Designed for applications where a DC signal output is not required, these pressure switches provide relay outputs that are readily interfaced with alarms, valve actuators, computers, process controllers, or other protection devices.
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2 MHz RF Plasma Generators
NOVA® Series
The NOVA ; RF Plasma Generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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2450 MHz Industrial Microwave Generators
Alter® 2450 MHz Industrial Microwave Generators are built on MKS Alter® Product experience and designed with rugged and reliable switch mode power supplies for demanding industrial applications. They offer compact generators up to 3kW in a 19 inch standard rack with a remote head and integrated isolator.